NPL's remote image analysis for the micro- and nano- fabrication of wafers is a valuable tool for semiconductor manufacturers. It can help to ensure the quality of semiconductor products by accurately measuring the physical dimensions of devices on semiconductor wafers. This can help to identify and address any potential problems early on in device manufacture, which can save time and money.
Here are some of the benefits of using NPL's remote image analysis for the fabrication of wafers:
- Improved quality: By accurately measuring the physical dimensions of wafers, it becomes easier to ensure the quality of semiconductor products.
- Early identification of problems: The system can help to identify and address any potential problems early on, which can save time and money.
- Cost-effective: The system is relatively inexpensive to operate.
- Easy to use: The system can be operated simply by a trained technician.
The semiconductor manufacturing process is complex. It involves a wide variety of steps, each of which can have an impact on the physical properties of the wafer. This makes it difficult to isolate the effects of individual process steps and to identify the root cause of any problems that may be encountered.
By accurately measuring the physical properties of semiconductor wafers, it becomes easier to ensure the quality of semiconductor products and to identify and address any potential problems early on. Metrology is an essential part of wafer fabrication. However, metrology equipment is often very expensive, and the cost of maintaining and operating this equipment can be high.
Visual inspection has a role to play because it is the simplest and most basic Non-Destructive Technique. But, because this involves a human who manually inspecting the wafers for defects, such as cracks, scratches, and pits, visual inspection can be slow and error prone.
NPL has capability that can help. We have developed remote image analysis for the fabrication of wafers. Using images fed via electronic transfer, NPL Huddersfield offers a dimensional analysis. The capability offers positional data in situ so that subsequent deposition process steps can continue with confidence.
The capability enables meaningful statistics to be obtained across large diameter wafers for process control data. Measurement routines may be set up in collaboration with an expert user and can then be accessed routinely for wafer-to-wafer data acquisition.
From spring 2024 the capability will be housed in an industry-standard cleanroom suite, located in the James Watt Nanofabrication Centre, University Avenue, Glasgow.
NPL welcomes approaches from other clean rooms who would benefit from this capability.
Are you interested in learning more about our quantum capabilities?
Contact a member of NPL's quantum team today to schedule a consultation. We can discuss your specific needs and how our quantum technologies can help you achieve your goals.
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