National Physical Laboratory

Andrew J Pollard

Current interests

Andrew Pollard
  • Metrology of graphene and graphene industrial applications
  • Characterisation of graphene and related 2D materials
  • International standardisation of graphene and related 2D materials


After joining NPL in 2009, Andrew Pollard is now leading the Surface and Nanoanalysis Group's research into the structural and chemical characterisation of graphene and related 2D materials, with a focus on enabling industrial commercialisation in this area. This metrology research addresses the actual measurement of 2D materials with a range of surface characterisation techniques, such as Raman spectroscopy and tip-enhanced Raman spectroscopy (TERS), scanning probe microscopies (SPM), scanning electron microscopy (SEM), secondary ion mass spectrometry (SIMS) and X-ray photoelectron spectroscopy (XPS).

Andrew is a member of the ISO working group 'Measurement and Characterisation' within the 'Nanotechnologies' Technical Committee (TC229), and a UK nominated expert for the international graphene standards currently in development in ISO/TC229 and IEC/TC113. As part of his role as the Industry Standardisation Leader at the NGMC, he is leading two international standards within ISO/TC229 and heavily engaged with companies around the world producing or using graphene. Andrew is a Visiting Academic at the National Graphene Institute (NGI) at the University of Manchester, the co-chair of the VAMAS Technical Working Area 'TWA 41: Graphene and Related 2D Materials' and is on the advisory board of several graphene entities.

Selected publications

ResearcherID page

Contact details

Tel: 020 8943 6266

Last Updated: 13 Sep 2016
Created: 5 Nov 2010


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