January 2010

The use of large Ar_n⁺ cluster primary ions for organic depth profiling is a current hot topic in SIMS. In collaboration with Prof Jiro Matuso at Kyoto University, who pioneered the technique and developed the novel ion source, Joanna Lee evaluated the performance of Ar₅₀₀⁺ on NPL organic delta layer reference materials. This shows the potential for constant sputtering yield, low damage and excellent depth resolution compared with C₆₀ⁿ⁺ on the same material at similar analysis conditions. This seminal work was presented at SIMS XVII and is now published in Analytical Chemistry.