Opaque linewidth standard Clear linewidth standard 

Photomask linewidth standards are designed for use in the microelectronics industry and can also be used in image analysing measurement systems, fibre sizing and for the measurement of micro-engineered components. Linewidths between 0.5 µm and 150 µm are calibrated using a purpose built travelling microscope stage with an integrated laser interferometer to provide a measurement uncertainty of approximately 0.05 µm with the highest quality scales.

The NPL Optical Dimensional Standard provides as part of the large range of precision patterns, various patterns of lines with widths between 1 µm and 2000 µm.

NPL photomask linewidth standards are available in two versions with linewidths in the range from 1 µm to 10 µm or 0.5 µm to 50 µm. Both versions also contain 100 µm long Linescales of 4 µm and 10 µm pitch.

Contact

Customer Service tel: +44 20 8943 6245
E-mail: optics_enquiries@npl.co.uk