NPL photomask linewidth standards are designed for use in the microelectronics industry and can also be used in image analysing measurement systems, fibre sizing and for the measurement of micro-engineered components.

• NPL photomask linewidth standards - (2 µm to 10 µm)
• NPL photomask linewidth standards - (0.5 µm to 50 µm)
• Linewidth calibrations
• Calibration of SEM standards

For more information contact Michael McCarthy