Current interests

• Chemical characterisation using secondary ion mass spectrometry (SIMS)
• Developing measurement framework for the use of large argon clusters for organic depth profiling and 3D chemical analysis
• Application of 3D chemical analysis to OPV and OLED materials

Biography

Rasmus Havelund's work at NPL focuses on optimising and understanding 3D chemical analysis using SIMS. In particular, he is interested in the use of the recently developed argon cluster ion sources which have led to a step change in high-resolution 3D chemical analysis. Rasmus has a BSc and a MSc in nanoscience from Aarhus University in Denmark and joined NPL in 2011 after receiving a PhD, also from Aarhus University, where he had worked on development and surface analysis of novel polymer nanofibres.

Selected publications

• Molecular filters based on cyclodextrin functionalized electrospun fibers
  T. Uyar, R. Havelund, N. Yusuf, J. Hacaloglu, F. Besenbacher, P. Kingshott
  Journal of Membrane Science, 332, pages 129-137 (2009)

Contact details

Email: rasmus.havelund@npl.co.uk
Tel: 020 8943 6202