Current Interests

• Sputtering for analysis of the surface and nanoparticles.
• Secondary Ion Mass Spectrometry for Organic Materials
• Analytical nanomechanics

Biography

Martin Seah is part of the Surface and Nanoanalysis Research team. He joined NPL in 1969 to work on interfacial chemistry and its effects in metals. In 1980 he became head of a team to establish the measurement infrastructure in surface and nanoanalysis. This work covers Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS) and more recently G-SIMS and atomic force microscopy (AFM). Current work involves the development and application of these methods. Martin has published over 350 scientific papers as well as editing, with David Briggs, the well-known 'Practical Surface Analysis' volumes. Martin is a Senior NPL Fellow, Fellow of the Institute of Physics, Fellow of the Institute of Materials, Minerals and Mining, and Fellow of the American Vacuum Society. He provided the basis to launch Technical Working Area 2 on Surface Chemical Analysis of the Versailles Project on Advanced Materials and Standards (VAMAS) and to launch the Surface and Micro/Nano Analysis Working Group of the Consultative Committee for Amount of Substance (CCQM). He is Chairman of Subcommittee 1 on Terminology in ISO TC 201 on Surface Chemical Analysis and has been project leader for 10 ISO standards. He was awarded, inter alia, the 1978 Henry Marion Howe Medal of the American Society for Metals, the 1989 Albert Nerken Award of the American Vacuum Society, the 1995 British Vacuum Council Medal and Prize, the 1996 Institute of Physics Duddell Medal and Prize, and the 2004 International Union for Vacuum Science, Technique and Applications Prize in Technology.

Selected Publications

1. Relationships Between Cluster Secondary Ion Intensities Generated by Different Cluster Primary Ions
   M. P. Seah, F. M. Green and I. S. Gilmore
   J. Am. Soc. Mass Spectrom., 21, pages 370-377 (2010)
2. Analysis of Cluster Ion Sputtering Yields: Correlation with the Thermal Spike Model and Implications for Static Secondary Ion Mass Spectrometry
   M. P. Seah.
   Surf. Interface Anal., 39, pages 634-643 2007)
3. Ultra thin SiO₂ on Si IX: Absolute Measurements of the Amount of silicon oxide as a thickness of SiO₂ on Si
   M. P. Seah, W. E. S. Unger, H. Wang, W. Jordaan, T. Gross, J. A. Dura, D. W. Moon, P. Totarong, M. Krumrey, R. Hauert and M. Zhiqiang
   Surf. Interface Anal., 41, pages 430-439 (2009)
4. Nanoindentation Measurement of Young's Modulus for Compliant Layers on Stiffer Substrates Including the Effect of Poisson's Ratios
   C. A. Clifford and M. P. Seah
   Nanotechnology, 20, page 145708 (2009)
5. Cluster Primary Ions: Spikes, Sputtering Yields and Inter-relationships for Secondary Molecular Ions for Static SIMS
   M. P. Seah
   J. Vac. Sci. Technol. A, 26, pages 660-667 (2008)

Contact details

Email: martin.seah@npl.co.uk
Tel: 020 8943 6634